X-ray Diffraction at Elevated Temperatures

X-ray Diffraction at Elevated Temperatures: A Method for In Situ Process Analysis

Hardback Published on: 26/02/1993
Price: £279
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Synopsis

In light of the growing importance and availability of intense x-ray sources and position-sensitive detectors, this book offers comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis) for carrying out phase identification, texture analysis, and grain size measurement by way of in situ process analysis at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, chemical and electrical analysis.

Publisher information

  • Publisher: John Wiley and Sons Ltd
  • ISBN: 9780471187264
  • Number of pages: 268
  • Dimensions: 241 x 160 x 21 mm
  • Weight: 560g

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